#methodological rigourSupporting methods not fully inspectable
The article repeatedly sends fabrication details and detailed Shubnikov-de Haas analysis to supporting online material [15]. That is typical for a short Science report, but it limits independent assessment of the complete procedure and derivations from the supplied text alone.
↳ Main text, methods paragraph; Reference [15]
#impact potentialExfoliation limits direct translation
The demonstrated preparation method is repeated mechanical peeling from highly oriented pyrolytic graphite. It is effective for discovery-scale devices but does not establish scalable wafer-level production or industrial integration.
↳ Main text, fabrication paragraph
#impact potentialSwitching ratio remains fundamentally modest
The article reports an on-off resistance ratio below approximately 30 at 300 K and attributes this to thermally excited carriers in a material without a sufficient band gap. This limits immediate transistor competitiveness despite the strong field effect.
↳ Main text, final transistor paragraph